Method of manufacturing a membrane assembly
AssigneeASML Netherlands B.V.
InventorsPaul Janssen, Jan Hendrik Willem Kuntzel
Life of this patent
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Abstract
A method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate including: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.
Claims20
A method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided at a first side of the assembly prior to etching, if any, at the first side and after one or more etching steps which define a pellicle border holding the pellicle membrane at a second side of the assembly opposite the first side.
A pellicle substrate, the substrate comprising:
- a stack having a front face and back face,
- wherein at least part of one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before a layer which forms at least part of a pellicle membrane has been provided to the front face, wherein the layer which forms at least part of the pellicle membrane is provided at the front face prior to etching, if any, at the front face.
Dependencies are inferred from the claim text.