Pedestal for substrate processing chambers

A pedestal for disposition in a substrate processing chamber suitable for use in semiconductor manufacturing, comprising:

• a body, the body comprising a support surface, a stepped surface that protrudes upwards from the support surface, the stepped surface having an innermost surface extending upwards from the support surface, the stepped surface being disposed about the support surface to surround the support surface, and the stepped surface defining an edge ring such that the edge ring is monolithically integrated with the body;
• a plurality of electrodes disposed in the body at a depth below the support surface, a first electrode of the plurality of electrodes being uncoated and contacting the body, a second electrode of the plurality of electrodes disposed at a second depth below the first electrode, the second electrode having a coating composed of a different material than the body and disposed radially outward of a distal end of the first electrode, the coating having a volumetric electrical resistivity that is greater than a volumetric electrical resistivity of the second electrode, the coating disposed on a first surface of the second electrode and a second surface of the second electrode opposite the first surface, and the coating having:
• an inner radius aligned radially outward of a center of the body and inward of the innermost surface, and
• an outer radius aligned radially outwardly of the innermost surface;
• and one or more heaters disposed in the body.