Load assemblies for loading parts in a furnace

A load assembly comprising:

• a first diffuser plate;
• a second diffuser plate oriented substantially parallel to and spaced apart from the first diffuser plate, wherein the first and second diffuser plates are positioned with respect to each other such that there is a space between the first and second diffuser plates;
• a plurality of fixtures, a first fixture of the plurality of fixtures configured to be positioned in the space and supported between the first and second diffuser plates, wherein the first fixture is configured to contain a part to be treated by gases flowing through the load assembly;
• a plurality of channel forming features configured to be positioned relative to the first fixture to guide the flow of gases into a plurality of ducts defined by the plurality of channel forming features and the first fixture, wherein the plurality of ducts are configured to at least partially contain gas flowing through the plurality of ducts and direct at least some of the gas to the part contained by the first fixture;
• wherein each diffuser plate defines a plurality of apertures located at desired areas of the diffuser plate relative to the plurality of ducts such that apertures of the plurality of apertures and ducts of the plurality of ducts are in fluid communication;
• and
• wherein more than one aperture of the plurality of apertures are configured to guide gases flowing through the first diffuser plate into the first fixture to route gases to the part contained by the first fixture such that the gases interact with the part.

A method of CVI/CVD processing comprising:

• receiving reactant gases in a load assembly, wherein the load assembly is disposed within a furnace working zone;
• directing the flow of the reactant gases through the load assembly, wherein the load assembly comprises a first diffuser plate, a second diffuser plate oriented substantially parallel to and spaced apart from the first diffuser plate, wherein the first and second diffuser plates are positioned with respect to each other such that there is a space between the first and second diffuser plates;
• wherein directing the flow of reactant gases includes guiding reactant gases substantially between the first diffuser plate and the second diffuser plate through a plurality of ducts;
• wherein the plurality of ducts are defined by a plurality of channel forming features and a first fixture of a plurality of fixtures, wherein the plurality of ducts are configured to at least partially contain reactant gases flowing through the plurality of ducts and direct at least some of the gas to a part contained by the first fixture;
• wherein the first fixture is configured to be positioned in the space and supported between the first and second diffuser plates, wherein the first fixture is configured to contain the part to be treated by gases flowing through the load assembly,
• wherein the plurality of channel forming features are configured to be positioned relative to the first fixture to guide the flow of gases into a plurality of ducts defined by the plurality of channel forming features and the first fixture;
• wherein each diffuser plate defines a plurality of apertures located at desired areas of the diffuser plate relative to the plurality of ducts such that apertures of the plurality of apertures and ducts of the plurality of ducts are in fluid communication,
• wherein more than one aperture of the plurality of apertures are configured to guide gases flowing through the first diffuser plate into the first fixture to route gases to the part contained by the first fixture such that the gases interact with the part;
• and
• exhausting the reactant gases from the load assembly.