Substrate treating apparatus and substrate treating method
AssigneeSCREEN Holdings Co., Ltd.
InventorHirofumi Tonai
Life of this patent
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AssigneeSCREEN Holdings Co., Ltd.
InventorHirofumi Tonai
Estimating the term…
Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a holding mechanism including a plurality of support pins configured to rotate between a holding position and a delivery position, a first magnetic part configured to rotate the support pins individually between the holding position and the delivery position by switching surrounding magnetic poles, and a second magnetic part configured to rotate the support pins individually to the holding position by constantly applying a magnetic field to the first magnetic part; and a switching mechanism configured to apply no magnetic field of a third magnetic part to the first magnetic part normally and apply a magnetic field of the third magnetic part to the first magnetic part to rotate the support pins individually to the delivery position only when the substrate is delivered.
A substrate treating apparatus for performing a predetermined treatment on a substrate, the apparatus comprising:
A substrate treating apparatus for performing a predetermined treatment on a substrate, the apparatus comprising:
Dependencies are inferred from the claim text.