Sanitary equipment part

A part comprising a base material, a colored layer on the base material, and a surface layer on the colored layer, wherein

• the colored layer contains Zr and optionally, C and/or N,
• a ratio HZr oxide/HZr of a peak height derived from Zr oxide HZr oxide to a peak height of Zr HZr at an interface of the colored layer on the side of the surface layer, in a profile obtained by an XPS depth direction analysis, is more than 0 and less than 4.5, the XPS depth direction analysis being performed under the following XPS measurement conditions and Sputtering conditions 1,
• XPS measurement conditions
• X-ray condition:
• monochromatic AlKα ray (output 25 W),
• Photoelectron take-off angle:
• 45°,
• Analysis area:
• 100 μmφ,
• Charge neutralizer setting:
• 1.0 V, 10 μA,
• Time per step:
• 50 ms,
• Sweep:
• five times,
• Pass energy:
• 112 eV, and
• Element to be analyzed (energy range):
• Zr3d (177-187 eV), C1s (281-296 eV), N1s (394-406 eV), O1s (524-540 eV), Cr2p3 (572-582 eV), Ti2p (452-463 eV), Si2p (98-108 eV),
• Sputtering conditions 1
• Inert gas species:
• Ar,
• Sputtering voltage:
• 500 V,
• Sputtering range:
• 2 mm*2 mm, and
• Sputtering cycle:
• 10 seconds, and
• the ratio HZr oxide/HZr at a point where Ar sputtering is performed for 5 minutes from the interface of the colored layer on the side of the surface layer with an XPS depth direction analysis is between 0 or more and less than 3, the XPS depth direction analysis being performed under said XPS measurement conditions and the following Sputtering conditions 2,
• Sputtering conditions 2
• Inert gas species:
• Ar
• Sputtering voltage:
• 500 V
• Sputtering range:
• 2 mm*2 mm
• Sputtering cycle:
• 1 minute;
• and
• the surface layer
• is water-repellent, and
• includes a hydrophobic group, and
• exhibits a sputtering time of 5 minutes or less, the sputtering time being a time taken from the start of the sputtering to an end point of the surface layer, and the end point being defined, in a profile obtained by an XPS depth direction analysis of the surface layer, as a point where an absolute value of a difference between a carbon atom concentration at a certain measurement point and a carbon atom concentration at an immediately previous measurement point to the certain measurement point is 1.0 at % or less, the XPS depth direction analysis being performed under said XPS measurement conditions and said Sputtering conditions 1.