Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same
AssigneeMerck Patent GmbH
InventorsToshiya Okamura, Tetsuo Okayasu, Thorsten Vom Stein
Life of this patent
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AssigneeMerck Patent GmbH
InventorsToshiya Okamura, Tetsuo Okayasu, Thorsten Vom Stein
Estimating the term…
[Problem] To provide a polycarbosilazane making it possible to form a silicon-containing film which is bearable to acid etching, and a composition comprising the polycarbosilazane. [Means for Solution] The present invention provides a polycarbosilazane comprising a repeating unit of —[R1R2Si—(CH2)n]— and —(R3R4Si—NR5)—, wherein R1, R2, R3 and R4 are each independently a single bond, hydrogen or C1-4 alkyl; R5 is independently a single bond or hydrogen; and n is 1-2, and a composition comprising the polycarbosilazane. The present invention also provides a method for forming a silicon-containing film, comprising coating the composition above a substrate and heating.
A polycarbosilazane comprising a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2):
A polycarbosilazane comprising a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2):
Dependencies are inferred from the claim text.