Method for producing organometallic compound and thin film fabricated using organometallic compound obtained thereby
AssigneesHansol Chemical Co., Ltd., Industry-Academic Cooperation Foundation, Yonsei University
InventorsJin-Hyung Seo, Mi-Ra Park, Jang-Hyeon Seok, Jung-Woo Park, Hyung-Jun Kim, Tae-Wook Nam, Yu-Jin Lee
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Abstract
The present invention relates to a method for producing a high yield of an organometallic compound including a step of allowing a metal hexacarbonyl compound to react with a hexahydro-1,3,5-triazine compound, and a thin film having excellent properties, fabricated by depositing the produced organometallic compound.
Claims5
A method for producing an organometallic compound, the method comprising a first step of synthesizing a compound of the following Formula 2 by allowing a metal hexacarbonyl compound to react with a compound of the following Formula 1;
- a second step of synthesizing a compound of the following Formula 4 by allowing the compound of Formula 2 to react with a compound of the following Formula 3;
- a third step of synthesizing a compound of the following Formula 6 by allowing the compound of Formula 4 to react with a compound of the following Formula 5,
- wherein
- R1 to R3 are each independently hydrogen or a linear or branched hydrocarbon having 1 to 4 carbon atoms,
- R4 is hydrogen or a linear or branched hydrocarbon having 1 to 3 carbon atoms,
- R5 and R6 are each independently hydrogen or a linear or branched hydrocarbon having 1 to 4 carbon atoms,
- R7 to R9 are hydrogen, and
- M is tungsten (W).
Dependencies are inferred from the claim text.