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US 11,999,098 B2Granted
Parallelized 3D lithography using multi-beam, multi-color light-induced polymerization
AssigneeKarlsruher Institut für Technologie
InventorsVincent Hahn, Patrick Müller, Eva Blasco, Martin Wegener
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Abstract
The present invention relates to a method for additive manufacturing of a 3D-structured form and to a device for additive manufacturing of a 3D-structured form.
Claims13
A method for additive manufacturing of a 3D-structured form, the method comprising the steps of:
- i) providing a liquid photoresist comprising at least one monomer and at least one photoinitiator system comprising an α-diketone or a photochromic compound selected from the group consisting of 2-methoxy naphthalene and spiropyrans;
- and
- ii) irradiating the liquid photoresist with a first light source at a first wavelength Ai and with a second light source at a second wavelength λ2 either simultaneously or sequentially with a time interval of less than 1 ms to harden the liquid photoresist and produce the 3D-structured form,
- wherein λ1≠λ2, and
- wherein the hardening of the liquid photoresist to produce the 3D-structured form takes place only at the position which is irradiated by the first light source and the second light source either simultaneously or sequentially with the time interval of less than 1 ms.
2 more elements
A device for additive manufacturing of a 3D-structured form, starting from a liquid photoresist, the device comprising:
- a first light source with a first wavelength λ1;
- a second light source with a second wavelength λ2;
- and
- a substrate configured for providing the liquid photoresist,
- the liquid photoresist comprising at least one monomer and at least one photoinitiator system comprising an α-diketone or a photochromic compound selected from the group consisting of 2-methoxy naphthalene and spiropyrans,
- wherein λ1≠λ2, and
- wherein the first light source and the second light source are configured to be oriented toward the substrate and are configured to irradiate the liquid photoresist either simultaneously or sequentially with a time interval of less than 1 ms in order to harden the liquid photoresist only at the position which is irradiated by the first light source and the second light source either simultaneously or sequentially with the time interval of less than 1 ms.
4 more elements
Dependencies are inferred from the claim text.