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US 11,994,470 B2Granted
Pixel-wise point spread function engineering systems and methods
AssigneeWashington University
InventorsMatthew Lew, Tingting Wu
Life of this patent
Estimating the term…
Abstract
Systems, devices, and methods for producing an optimized phase mask for use in a single-molecule orientation localization microscopy (SMOLM) imaging system are disclosed.
Claims18
A computer-implemented method for producing an optical mask for an SMOLM imaging system, the method comprising:
- a. providing, to a computing device, a baseline optical mask comprising a plurality of mask pixels distributed at a plurality of mask pixel positions within a mask plane, each mask pixel comprising at least one optical modulation element configured to modulate at least one optical parameter of a photon produced by an emitter propagating therethrough;
- b. providing, to the computing device, a plurality of emitter images indicative of dipole spread functions captured using the SMOLM imaging system provided with the baseline optical mask, each image comprising a plurality of image pixels indicative of a dipole spread function, each image pixel comprising a pixel position and a pixel intensity indicative of a number of photons detected at the pixel position, wherein each emitter image is obtained for a reference emitter positioned at a reference lateral position and at one sample orientation within an orientation space;
- c. determining, using the computing device, a loss function comprising a matrix quantifying variances in precision of emitter orientations estimated from the dipole spread functions from the plurality of images;
- d. iteratively modifying, using the computing device, at least one optical parameter of at least one mask pixel to minimize the loss function to produce the optical mask.
1 more element
A computer-implemented method for producing a phase mask for an SMOLM imaging system, the method comprising:
- a. providing, to a computing device, a baseline phase mask comprising a plurality of mask pixels distributed at a plurality of mask pixel positions within a mask plane, each mask pixel comprising a phase modulation element configured to modulate the phase of a photon produced by an emitter propagating therethrough;
- b. providing, to the computing device, a plurality of emitter images indicative of dipole spread functions captured using the SMOLM imaging system provided with the baseline optical mask, each image comprising a plurality of image pixels indicative of a dipole spread function, each image pixel comprising a pixel position and a pixel intensity indicative of a number of photons detected at the pixel position, wherein each emitter image is obtained for a reference emitter positioned at a reference lateral position and at one sample orientation within an orientation space;
- c. determining, using the computing device, a loss function comprising a matrix quantifying variances in precision of emitter orientations estimated from the dipole spread functions from the plurality of images;
- d. iteratively modifying, using the computing device, at least one optical parameter of at least one mask pixel to minimize the loss function to produce the phase mask.
1 more element
Dependencies are inferred from the claim text.