Gas nozzle, substrate processing apparatus, and substrate processing method
AssigneeTokyo Electron Limited
InventorsKuniyasu Sakashita, Satoru Ogawa
Life of this patent
Estimating the term…
Abstract
A gas nozzle extending vertically inward of an inner wall of a processing container having a substantially cylindrical shape, includes a plurality of first gas holes provided at intervals in a longitudinal direction; and a second gas hole provided at a tip of the gas nozzle and oriented toward a side opposite to a side in which the plurality of first gas holes are provided in a plan view from the longitudinal direction, wherein the second gas hole has an opening area larger than an opening area of each of the first gas holes.
Claims9
A gas nozzle extending vertically inward of an inner wall of a processing container having a substantially cylindrical shape, comprising:
- a cylindrical portion having a cylindrical shape in the inner wall;
- a closing portion located at a tip of the cylindrical portion to close the tip and having a rounded curved surface shape;
- a plurality of first gas holes provided at the cylindrical portion at intervals in a longitudinal direction;
- and
- a second gas hole provided at the closing portion and oriented diagonally upward with respect to the inner wall on a side opposite to a side in which the plurality of first gas holes are provided in a plan view from the longitudinal direction, wherein the second gas hole has an opening area larger than an opening area of each of the first gas holes.
A substrate processing apparatus comprising:
- a processing container having a substantially cylindrical shape;
- and
- a gas nozzle extending vertically inward of an inner wall of the processing container,
- wherein the gas nozzle includes:
- a cylindrical portion having a cylindrical shape in the inner wall;
- a closing portion located at a tip of the cylindrical portion to close the tip and having a rounded curved surface shape;
- a plurality of first gas holes provided at the cylindrical portion at intervals in a longitudinal direction;
- and
- a second gas hole provided at the closing portion and oriented diagonally upward with respect to the inner wall on a side opposite to a side at which the plurality of first gas holes are provided in a plan view from the longitudinal direction, wherein the second gas hole has an opening area larger than that of each of the first gas holes.
Dependencies are inferred from the claim text.