Passivation of silicon dioxide defects for atomic layer deposition
AssigneeThe Regents of the University of California
InventorsSteven Wolf, Michael Breeden, Ashay Anurag, Andrew Kummel
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Abstract
The present inventive concept is related to methods for passivating an oxide layer and methods of selectively depositing a metal, metal nitride, metal oxide, or metal silicide layer on a metal, metal oxide, or silicide layer over an oxide layer including exposing the oxide layer to a passivant that selectively binds to the oxide layer over the metal, metal oxide, or silicide layer, and selectively growing the metal, metal nitride, metal oxide or metal silicide layer on the metal, metal oxide or silicide layer.
Claims10
A method for selectively depositing a metal, metal nitride, metal oxide, or metal silicide layer on a substrate, the substrate comprising a surface, the surface comprising:
- an SiO2 layer portion comprising hydroxyl groups on SiO2;
- and a metal or metal oxide portion, the method comprising:
- a) pre-treating the SiO2 layer portion of the surface, wherein the pre-treating cleans and renders the SiO2 layer portion of the surface hydrophilic;
- b) exposing the surface to a passivant for a period of time between about 2 hours and less than about 24 hours at a temperature of about 200° C. or below that renders the surface of the SiO2 layer portion of the surface hydrophobic;
- c) annealing the substrate at a temperature of about 300° C. or above to selectively passivate the SiO2 layer portion of the surface over the metal or metal oxide portion of the surface, wherein the passivant binds selectively to —OH or O on the SiO2 layer portion over the metal or metal oxide portion above about 300° C., wherein the passivant is selectively bound to the SiO2 portion of the surface over the metal or metal oxide portion of the surface, and wherein the metal or metal oxide of the surface is unpassivated and/or has characteristics of an unpassivated surface after the substrate is annealed;
- and
- d) selectively growing the metal, metal nitride, metal oxide, or metal silicide layer on the metal or metal oxide portion of the surface,
- wherein the passivant enhances selective growth of the metal, metal nitride, metal oxide, or metal silicide layer on the metal or metal oxide portion of the surface over the SiO2 layer portion of the surface, and wherein the metal, metal oxide, metal nitride, or metal silicide layer is grown by atomic layer deposition (ALD), and wherein the passivant is tetramethyldisilazane (TMDS).
A method for selectively depositing a molybdenum silicide TiO2 layer on a substrate, the substrate comprising a surface, the surface comprising:
- a SiO2 portion;
- and a Cu or Co portion, the method comprising:
- a) pre-treating the SiO2 portion of the surface, the SiO2 portion of the surface comprising hydroxyl groups, wherein the pre-treating renders the SiO2 portion of the surface hydrophilic;
- b) exposing the SiO2 portion of the surface to a passivant for a period of time of less than about 24 hours at a temperature of about 200° or below that renders the surface of the SiO2 portion of the surface hydrophobic;
- c) annealing the substrate at a temperature of about 300° C. or above to selectively passivate the SiO2 portion of the surface over the Cu or Co portion of the surface, wherein the passivant is selectively bound to the SiO2 portion of the surface over the Cu or Co portion of the surface, and wherein the Cu or Co portion of the surface is unpassivated and/or has characteristics of an unpassivated surface after the substrate is annealed;
- and
- d) selectively growing the molybdenum silicide or TiO2 layer on the Cu or Co portion of the surface,
- wherein the passivant enhances selective growth of the molybdenum silicide or TiO2 layer on the Cu or Co portion of the surface over the SiO2 portion of the surface, wherein the molybdenum silicide or TiO2 layer is grown by atomic layer deposition (ALD), and wherein the passivant is tetramethyldisilazane (TMDS).
Dependencies are inferred from the claim text.