Mask and method of manufacturing the same, and mask assembly
AssigneesChengdu Boe Optoelectronics Technology Co., Ltd., Boe Technology Group Co., Ltd.
InventorsYong Zheng, Shuai Du, Wenbiao Ding
Life of this patent
Estimating the term…
Loading patent…
AssigneesChengdu Boe Optoelectronics Technology Co., Ltd., Boe Technology Group Co., Ltd.
InventorsYong Zheng, Shuai Du, Wenbiao Ding
Estimating the term…
A mask has a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region. The mask pattern region includes at least one effective mask region. In any effective mask region, the mask includes a plurality of evaporation holes and at least one shielding; strip. Each shielding, strip is located between two adjacent evaporation holes. The mask has at least one welding region in the non-mask pattern region. A thickness of a portion of the mask in the non-mask pattern region and at least in the welding region is greater than a thickness of the shielding strip of the mask in the effective mask region, and the thickness refers to a dimension of the corresponding portion along a direction perpendicular to a plane where the mask is located.
A mask, having a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region, wherein
A method of manufacturing a mask, the mask having a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region;
Dependencies are inferred from the claim text.