A chip for sample analysis, comprising:
- a sample storage unit;
- a capture path configured to capture an analyte contained in a sample and communicating with the sample storage unit;
- a washing solution storage unit communicating with the capture path;
- and
- a delay unit included between the capture path and the washing solution storage unit such that a washing solution flowing from the washing solution storage unit to the capture path passes through,
- wherein, when the chip is rotated for sample analysis, the delay unit is configured to delay the passage of the washing solution introduced from the washing solution storage unit such that the washing solution reaches the capture path later than the sample,
- wherein the delay unit comprises:
- a delay chamber capable of storing a washing solution directed to the capture path from the washing solution storage unit;
- an introduction channel included between the washing solution storage unit and the delay chamber such that the washing solution flows from the washing solution storage unit to the delay chamber;
- and
- a delay channel included between the delay chamber and the capture path such that the washing solution stored in the delay chamber is discharged when stored at a predetermined amount or more,
- wherein the delay channel comprises:
- a first path extending radially inward from an outlet of the delay chamber;
- and
- a second path extending radially outward from the end of the first path, the first path and the second path being configured to have the washing solution flow in opposite directions to each other, and
- wherein a length of the first path with respect to a radially inward direction corresponds to a discharge level of the washing solution stored in the delay chamber, such that the washing solution stored in the delay chamber is discharged when having reached the discharge level or more,
- wherein the introduction channel comprises:
- a third path extending away from the delay chamber in a direction parallel to a width direction of the delay chamber, the third path being configured to have the washing fluid flow away from the delay chamber;
- and
- a fourth path extending closer to the delay chamber in a direction parallel to the third path from an end of the third path, the third path and the fourth path being configured to have the washing solution flow in opposite directions to each other,
- wherein the third path is connected to a farther side of the washing solution storage unit from a rotational axis of the chip, and the fourth path is positioned farther than the third path from the rotational axis of the chip and is connected to the delay chamber, which is positioned farther than the fourth path from the rotational axis of the chip,
- wherein the third path only extends away from the delay chamber, and the fourth path only extends closer to the delay chamber, and
- wherein the delay chamber comprises:
- an outlet side formed linearly along a radial direction and connected to the first path through the outlet;
- and
- an inlet side formed linearly and perpendicularly to the outlet side and connected to the fourth path through an inlet, the inlet side being positioned radially closer from the axis than the discharge level.