Resist composition and method of forming resist pattern

A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by an action of an acid, the resist composition comprising:

• a base material component (A) whose solubility in a developing solution changes by an action of an acid;
• and
• a fluorine-additive component (F),
• wherein the base material component (A) includes a high-molecular-weight compound (A1) having a constitutional unit (a0) represented by General Formula (a0-1), and
• the fluorine additive component (F) includes a high-molecular-weight compound (F1) having a constitutional unit (f01) represented by General Formula (f01-1) and a constitutional unit (f02) including an acid-dissociable group represented by General Formula (f02-r-1),
• wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms;
• Va01 represents a divalent linking group;
• na01 is an integer of 0 to 2;
• and Ra01 represents a lactone-containing cyclic group having at least one substituent selected from the group consisting of a halogen atom, a carboxyl group, an acyl group, a nitro group, and a cyano group,
• wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms;
• Vf01 represents a divalent linking group;
• and Rf011 and Rf012 each independently represents a hydrogen atom, a fluorine atom, a hydroxyl group, a methyl group, or a trifluoromethyl group, and
• wherein Rf021 and Rf022 each independently represents an alkyl group having 1 to 3 carbon atoms, which may have a substituent;
• Rf023 represents a polycyclic aliphatic hydrocarbon group which may have a substituent;
• and * represents a bond.