Multi-stack susceptor reactor for high-throughput superconductor manufacturing
AssigneeMetOx International, Inc.
InventorsShahab Khandan, Nagaraja Shashidhar, Mikhail Novozhilov
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Abstract
A vapor deposition reactor apparatus, systems and methods for deposition of thin films, particularly high-temperature superconducting (HTS) coated conductors, utilize multi-sided susceptors and susceptor pairs for increased production throughput. The reactors may also be configured in multi-stack arrangements of the susceptors within a single reactor chamber for additional throughput gains.
Claims20
A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising:
- a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor, and
- wherein the susceptor comprises a heater element configured to heat both upper and lower surfaces of the susceptor;
- and
- an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said elongated substrate tape slidably contacts both the upper and lower surfaces of the susceptor.
A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising:
- a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a two-piece substrate susceptor comprising an upper first substrate susceptor half and a lower second substrate susceptor half, and
- wherein each susceptor half comprises a heater element;
- and
- an elongated substrate tape continuously spooled between a payout reel and a take-up reel, wherein said elongated substrate tape slidably contacts both the upper surface of the first susceptor half and the lower surface of the second susceptor half.
A vapor deposition system for manufacturing superconductors on an elongated substrate tape, the system comprising:
- a vapor deposition apparatus including a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor with more than one susceptor surface, more than one heater element connected to the substrate susceptor, and an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said substrate tape slidably contacts more than one susceptor surface of the substrate susceptor,
- a measuring unit configured to measure a parameter (P) of the vapor deposition apparatus,
- a master controller (MC) configured to receive the measured parameter (P) from the measuring unit;
- and
- a second controller (SC) configured to receive a command from the master controller (MC) and adjust a second parameter (P2) associated with the susceptor based on the measured parameter (P).
Dependencies are inferred from the claim text.