Optical sensor and detector for an optical detection

A method (300) for manufacturing an optical sensor (100), the method (300) comprising the following steps:

• a) providing a substrate (120);
• b) applying at least one electrode layer (124) to a second portion (126) of the surface (118) of the substrate (120) in a manner that the electrode layer (124), apart from a first edge portion (128) of the electrode layer (124), exhibits a thickness d0;
• and
• c) further applying a photoconductive layer (112), the photoconductive layer (112) having at least one photoconductive material (114), to a first portion (116) of the surface (118) of the substrate (120) in a manner that also the first edge portion (128) of the electrode layer (124) is covered by an edge portion (130) of the photoconductive layer (112), whereby an electrode-photoconductor interface (132) is formed at a surface (134) of the electrode layer (124),
• wherein the electrode-photoconductor interface (132) is formed in a fashion that the electrode-photoconductor interface (132) comprises a first segment (138), a second segment (140), and a third segment (142);
• wherein a thickness d1 of the electrode layer (124) along the electrode-photoconductor interface (132) within the first segment (138) equals the thickness d0 of the electrode layer (124);
• wherein a thickness d2 of the electrode layer (124) along the electrode-photoconductor interface (132) within the second segment (140) is equal to or exceeds the thickness d0 of the electrode layer (124);
• and
• wherein a thickness d3 of the electrode layer (124) along the electrode-photoconductor interface (132) within the third segment (142) decreases continuously and monotonically along the electrode-photoconductor interface (132) within the third segment (142) towards an edge (146) of the electrode layer (124).