Semiconductor device

A semiconductor device, comprising:

• a first electrode;
• a first semiconductor layer located on the first electrode, the first semiconductor layer being of a first conductivity type;
• a first insulating film extending downward from an upper surface of the first semiconductor layer;
• a second electrode located in the first insulating film, the second electrode extending in a vertical direction;
• a second semiconductor layer partially provided in an upper layer portion of the first semiconductor layer, the second semiconductor layer being next to the first insulating film with the first semiconductor layer interposed, the second semiconductor layer being of a second conductivity type;
• a third semiconductor layer partially provided in an upper layer portion of the second semiconductor layer, the third semiconductor layer being of the first conductivity type;
• a third electrode located higher than the upper surface of the first semiconductor layer, the third electrode overlapping a portion of the first insulating film, a portion of the first semiconductor layer, and a portion of the second semiconductor layer when projected onto a plane perpendicular to a first direction from the first electrode to the first semiconductor layer;
• a fourth electrode located higher than an upper end of the third electrode, the fourth electrode being electrically connected to the second electrode and the third semiconductor layer;
• and
• a second insulating film located between the third electrode and the fourth electrode, between the third electrode and the first semiconductor layer, and between the third electrode and the second semiconductor layer, wherein
• an outer edge of the third electrode is positioned outward of an outer edge of the first insulating film when projected onto the plane,
• the device further comprises a first conductive member,
• the first conductive member extends from the second electrode toward the fourth electrode, and is electrically connected to the second and fourth electrodes, and
• the second insulating film also is located between the third electrode and the first conductive member.