Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a substrate holder that holds a substrate and rotates said substrate;
• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate, and
• a moving mechanism that moves said camera to said imaging position above said substrate, wherein
• said imaging position is a position where a height position of a lower end of a light receiving surface of said camera is same as said upper end position of said cup member or a position lower than the upper end position.

A substrate processing apparatus comprising:

• a substrate holder that holds a substrate and rotates said substrate;
• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate,
• a mirror;
• and
• a moving mechanism that moves said mirror, wherein
• said camera is arranged in a region other than above said substrate, and
• said moving mechanism moves said mirror to said imaging position above said substrate to cause said mirror to reflect light from said imaging region to said camera.

A substrate processing apparatus comprising:

• a substrate holder that holds a substrate and rotates said substrate;
• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate, wherein
• said imaging position is a position on an upstream side in a rotation direction of said substrate with respect to said first nozzle.

A substrate processing apparatus comprising:

• a substrate holder that holds a substrate and rotates said substrate;
• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate,
• a second nozzle that discharges second processing liquid to said substrate;
• a fixing member for fixing said second nozzle;
• and
• a first moving mechanism that displaces said fixing member to move said second nozzle to above said substrate, wherein
• said camera is fixed to said fixing member.

A substrate processing apparatus comprising:

• a substrate holder that holds a substrate and rotates said substrate;
• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate, wherein
• said imaging region is an imaging region viewed along a direction closer to a circumferential direction than a radial direction of said substrate.

A substrate processing method comprising, in the substrate processing apparatus including a substrate holder that holds a substrate and rotates said substrate;

• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate:
• a holding step of holding a substrate by said substrate holder;
• a substrate rotation step of rotating said substrate holder that holds said substrate;
• a bevel processing step of discharging said first processing liquid from said first nozzle to an end portion of said substrate;
• and
• a bevel monitoring step of monitoring a discharge state of said first processing liquid based on a captured image acquired by said camera imaging said imaging region, wherein
• in said bevel monitoring step, a discharge state amount, which is a liquid column width or a discharge position of processing liquid discharged from a tip of said first nozzle, is obtained based on luminance values of pixels in a region located directly below said first nozzle and longer in a lateral direction than a length in a vertical direction in said captured image, and
• said region is set to a position including a part of said first processing liquid reflected on an upper surface of a substrate by specular reflection in said captured image.

A substrate processing method comprising, in the substrate processing apparatus including a substrate holder that holds a substrate and rotates said substrate;

• a cup member that surrounds an outer circumference of said substrate holder;
• an elevating mechanism that moves up said cup member so that an upper end portion of said cup member is located at an upper end position higher than said substrate held by said substrate holder;
• a first nozzle that has a discharge port at a position lower than said upper end position and discharges first processing liquid from said discharge port to an end portion of said substrate;
• a camera that images an imaging region that includes the first processing liquid discharged from said discharge port of said first nozzle and is viewed from an imaging position above said substrate:
• a holding step of holding a substrate by said substrate holder;
• a substrate rotation step of rotating said substrate holder that holds said substrate;
• a bevel processing step of discharging said first processing liquid from said first nozzle to an end portion of said substrate;
• and
• a bevel monitoring step of monitoring a discharge state of said first processing liquid based on a captured image acquired by said camera imaging said imaging region, wherein
• in said bevel monitoring step, a machine-learned classifier classifies said captured image into either a category without abnormality regarding a liquid column width or a discharge position of processing liquid discharged from a tip of said first nozzle, or a category with abnormality.