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US 11,908,725 B2Granted
Electrostatic chuck heater and manufacturing method therefor
AssigneeMiCo Ceramics Ltd.
InventorsJin Young Choi, Jun Won Seo, Ju Sung Lee
Life of this patent
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Abstract
The present invention relates to an electrostatic chuck heater having a bipolar structure, the electrostatic chuck heater comprising: a heater body having an internal electrode and an external electrode for selectively performing any one of an RF grounding function and an electrostatic chuck function according to a semiconductor process mode; and a heater support mounted below the heater body so as to support the heater body.
Claims12
An electrostatic chuck heater comprising:
- a heater body including an internal electrode and an external electrode configured to selectively perform any one of a radio-frequency (RF) grounding function and an electrostatic chuck function according to a semiconductor process mode;
- and
- a heater support mounted below the heater body to support the heater body,
- wherein the heater body further includes an external electrode connecting member disposed between an electrode layer and a heating element layer to electrically connect the external electrode and a rod installed in the heater support to each other, and
- wherein the external electrode connecting member is spaced apart from lower surfaces of the internal electrode and the external electrode by a predetermined distance and disposed in parallel to the electrodes, and both ends of the external electrode connecting member are bent toward the lower surface of the external electrode.
2 more elements
Dependencies are inferred from the claim text.