Dynamic temperature control of substrate support in substrate processing system

A method of manufacturing a temperature-controlled substrate support for a substrate processing system, comprising:

• embedding N resistive heaters in N zones of a substrate support;
• embedding a temperature sensor in one of the N zones of the substrate support;
• measuring N resistances of the N resistive heaters in the N zones of the substrate support;
• determining N−1 resistance ratios based on the N resistances;
• connecting a controller to the N resistive heaters and the temperature sensor;
• and
• programming the controller to control temperature in N−1 of the N resistive heaters in N−1 of the N zones, respectively, during operation of the substrate processing system in response to:
• a measured temperature in the one of the N zones;
• the N resistances of the N resistive heaters;
• and
• the N−1 resistance ratios.

A method for controlling temperatures of zones in a substrate support of a substrate processing system, comprising:

• measuring temperature in one of N zones of a substrate support during operation of the substrate processing system using a temperature sensor located in the one of the N zones, where N is an integer greater than one;
• measuring N resistances of N resistive heaters located in the N zones, respectively, during operation of the substrate processing system;
• and
• adjusting power to N−1 of the N resistive heaters in N−1 of the N zones, respectively, during operation of the substrate processing system to control temperatures in N−1 of the N zones in response to:
• the measured temperature in the one of the N zones;
• the N resistances of the N resistive heaters;
• and
• N−1 resistance ratios.