Apparatus and method for processing substrate
AssigneeSemes Co., Ltd.
InventorsJin Woo Jung, Do Hyeon Yoon, Yong Hee Lee
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus includes a substrate cleaning unit cleaning a substrate, a substrate drying unit drying the substrate, and a transfer robot transferring the substrate between the substrate cleaning unit and the substrate drying unit. The substrate drying unit includes a substrate processing container having a substrate processing space accommodating the substrate, and the transfer robot includes a surface temperature measurement sensor measuring a surface temperature of the substrate processing container.
Claims12
A substrate processing method of processing a substrate by using a substrate processing apparatus that comprises a substrate cleaning unit configured to clean the substrate and a substrate drying unit configured to dry the substrate and comprising a substrate processing container accommodating the substrate, the substrate processing method comprising:
- detecting whether a precedent substrate exists in the substrate processing container;
- measuring a surface temperature of the substrate processing container, wherein, when the precedent substrate exists in the substrate processing container, the measuring the surface temperature of the substrate processing container is performed during a time when the precedent substrate is taken out of the substrate processing container;
- determining whether the surface temperature of the substrate processing container deviates from a preset reference temperature range;
- transferring, in response to the determining that the surface temperature is within the preset reference temperature range, the substrate from the substrate cleaning unit to the substrate processing container of the substrate drying unit;
- and
- performing, in response to the determining that the surface temperature of the substrate processing container is out of the present reference temperature range, a drying prevention process on the substrate by spraying a chemical liquid to the substrate in the substrate cleaning unit.
A substrate processing method of processing a substrate by using a substrate processing apparatus that comprises a substrate cleaning unit configured to clean the substrate, and a substrate drying unit configured to dry the substrate and comprising a substrate processing container accommodating the substrate, the substrate processing method comprising:
- taking the substrate out of the substrate cleaning unit;
- measuring surface temperature of the substrate processing container;
- determining whether the surface temperature of the substrate processing container deviates from a preset reference temperature range;
- transferring, in response to the determining that the surface temperature of the substrate processing container is within the preset reference temperature range, the substrate to the substrate drying unit;
- and
- in response to the determining that the surface temperature of the substrate processing container is out of the preset reference temperature range, loading back the substrate into the substrate cleaning unit and performing a drying prevention process on the substrate by spraying a chemical liquid to the substrate.
Dependencies are inferred from the claim text.