Plasma processing apparatus

A plasma processing apparatus comprising:

• an upper electrode and a lower electrode which are disposed inside a processing container so as to face each other inside the processing container;
• and
• a dielectric shower for gas introduction disposed below the upper electrode,
• wherein the plasma processing apparatus generates a plasma in a space between the upper electrode and the lower electrode, and
• wherein the upper electrode includes:
• at least one slot configured to introduce VHF waves into the processing container;
• and
• a gas flow path provided independently of the at least one slot and in communication with the dielectric shower,
• wherein the at least one slot includes a plurality of slots,
• wherein each of the plurality of slots extends in a circumferential direction of the upper electrode,
• wherein one end of each of the plurality of slots is located radially more outward of the upper electrode than the other end, and
• wherein the gas flow path is disposed between the slots located adjacent to each other in a radial direction of the upper electrode.