Multi charged particle beam writing apparatus
AssigneeNuFlare Technology, Inc.
InventorsToshiki Kimura, Hirofumi Morita, Takanao Touya, Mitsuhiro Okazawa
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Abstract
In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.
Claims16
A multi charged particle beam writing apparatus comprising:
- a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam;
- and
- a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.
Dependencies are inferred from the claim text.