Cell structures and power routing for integrated circuits
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Wei Peng, Jiann-Tyng Tzeng, Kam-Tou Sio
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Wei Peng, Jiann-Tyng Tzeng, Kam-Tou Sio
Estimating the term…
Various memory cell structures and power routings for one or more cells in an integrated circuit are disclosed. In one embodiment, different metal layers are used for power stripes that are operable to connect to voltage sources to supply different voltage signals, which allows some or all of the power stripes to have a larger width. Additionally or alternatively, fewer metal stripes are used for signals in a metal layer to allow the power stripe in that metal layer to have a larger width. The larger width(s) in turn increases the total area of the power stripe(s) to reduce the IR drop across the power stripe. The various power routings include connecting metal pillars in one metal layer to a power stripe in another metal layer, and extending a metal stripe in one metal layer to provide additional connections to a power stripe in another metal layer.
A cell in an integrated circuit, the cell comprising:
An integrated circuit, comprising:
A method of fabricating an integrated circuit, the method comprising:
Dependencies are inferred from the claim text.