Calibration and monitoring of camera position and laser position and wavelength

A device for calibrating and monitoring a laser wavelength shift and the laser position displacement relative to a support,

• wherein the device comprises
• a pattern generator,
• a camera,
• one or several heat pumps,
• one or several temperature sensors, and
• a computer,
• wherein the device is configurable to make the laser illuminate the pattern generator and enable the camera and computer to record several individual patterns, and a composite pattern containing those individual patterns, enable by means of the heat pump and temperature sensor to control and record the temperature of one or several of the laser, pattern generator, camera, and the support, comprising the means to calculate pattern position displacements between corresponding individual patterns from composite patterns, responsivity parameters of the camera and laser position displacement and laser wavelength shift, laser position displacement and laser wavelength shift by means of the responsivity parameters and displacements between corresponding individual patterns.

A method for calibrating and monitoring the position displacement of a camera relative to a support,

• the method comprising in a calibration step:
• illuminating a pattern generator with laser light from a laser;
• controlling and recording the temperature of one or several of the laser, the pattern generator, the camera, and the support by means of a heat pump and a temperature sensor;
• recording by use of the camera and a computer individual patterns of light reflected by the pattern generator, or transmitted through the pattern generator;
• recording by use of the camera and computer a composite pattern of light consisting of the individual patterns concurrently with the recording of the temperatures of the temperature sensors;
• calculating from minimum a composite pattern the position displacement of the individual pattern components;
• calculating the individual pattern responsivity parameters relating the camera and laser position displacements and laser wavelength shift to the geometrical configuration of the laser, the pattern generator, and the camera;
• the method further comprising a monitoring step, wherein the monitoring step is either a first monitoring step or a second monitoring step,
• wherein the first monitoring step comprises:
• Illuminating a pattern generator with laser light;
• controlling and recording the temperature of one or several of the laser, the pattern generator, the camera, and the support by means of a heat pump and a temperature sensor;
• recording by use of the camera and computer a composite pattern of light consisting of the individual pattern components concurrently with the recording of the temperatures of the temperature sensors;
• calculating from minimum a composite pattern the position displacement of the individual pattern components;
• calculating the camera position displacement by use of the individual pattern displacements, and the responsivity parameters;
• wherein the second monitoring step comprises:
• controlling and recording the temperature of one or several of the laser, the camera, and the support by means of a heat pump and a temperature sensor;
• calculating the camera position displacement from the monitoring temperature recordings and the calibration responsivity relations between the camera and laser position displacement, laser wavelength shift, and temperature recordings.

A method for calibrating and monitoring a laser wavelength shift and the laser position displacement relative to a support,

• the method comprising in a calibration step:
• Illuminating a pattern generator with laser light from a laser;
• controlling and recording the temperature of one or several of the laser, the pattern generator, the camera, and the support by means of a heat pump and a temperature sensor;
• recording by use of the camera and a computer individual patterns of light reflected by the pattern generator, or transmitted through the pattern generator;
• recording by use of the camera and computer a composite pattern of light consisting of the individual patterns concurrently with the recording of the temperatures of the temperature sensors;
• calculating from minimum a composite pattern the position displacement of the individual pattern components;
• calculating the individual pattern responsivity parameters relating the camera and laser position displacements and laser wavelength shift to the geometrical configuration of the laser, the pattern generator, and the camera;
• the method further comprising a monitoring step, wherein the monitoring step is either a first monitoring step or a second monitoring step,
• wherein the first monitoring step comprises:
• Illuminating a pattern generator with laser light;
• controlling and recording the temperature of one or several of the laser, the pattern generator, the camera, and the support by means of a heat pump and a temperature sensor;
• recording by use of the camera and computer a composite pattern of light consisting of the individual pattern components concurrently with the recording of the temperatures of the temperature sensors;
• calculating from minimum a composite pattern the position displacement of the individual pattern components;
• calculating the laser wavelength shift and the laser position displacement by use of the individual pattern displacements, and the responsivity parameters;
• wherein the second monitoring step comprises:
• controlling and recording the temperature of one or several of the laser, the camera, and the support by means of a heat pump and a temperature sensor;
• calculating the laser wavelength shift and the laser position displacement, from the monitoring temperature recordings and the calibration responsivity relations between the camera and laser position displacement, laser wavelength shift, and temperature recordings.