Metrology method and associated metrology and lithographic apparatuses
AssigneeASML Netherlands B.V.
InventorsSebastianus Adrianus Goorden, Simon Reinald Huisman, Arjan Johannes Anton Beukman
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AssigneeASML Netherlands B.V.
InventorsSebastianus Adrianus Goorden, Simon Reinald Huisman, Arjan Johannes Anton Beukman
Estimating the term…
Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
A method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions;
Dependencies are inferred from the claim text.