Measurement method and measurement system

A measurement method performed by an information processing apparatus in a semiconductor manufacturing apparatus including a chamber, the measurement method comprising:

• a) acquiring, as reference data, first measurement data received by a reader antenna, the first measurement data including a signal of a resonance frequency of a resonant wave generated in the chamber in response to an electromagnetic wave transmitted from the reader antenna to the chamber, while a jig capable of performing wireless communication is not placed in the chamber;
• b) acquiring second measurement data received by the reader antenna, the second measurement data including the signal of the resonance frequency of the resonant wave and including a signal of a resonance frequency of a sensor installed in the jig in response to the electromagnetic wave transmitted from the reader antenna to the chamber, while the jig is placed in the chamber;
• c) calculating third measurement data by subtracting the reference data from the second measurement data acquired in b);
• and
• d) estimating physical characteristics in the chamber based on the third measurement data,
• wherein the jig is placed on a stage provided in the chamber;
• and
• the physical characteristics include a temperature at the stage;
• and
• wherein the sensor is provided with a plurality of sensor devices, each of the plurality of sensor devices having a resonance frequency different from each other;
• the second measurement data acquired in b) includes signals of the resonance frequencies of the plurality of sensor devices;
• and
• a temperature at each of the plurality of sensor devices is estimated in d), based on the resonance frequencies of the plurality of sensor devices that are detected from the third measurement data calculated in c).