Raman spectroscopy based measurement system
AssigneeNova Ltd.
InventorYonatan Oren
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AssigneeNova Ltd.
InventorYonatan Oren
Estimating the term…
A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: performing measurements on a patterned structure by illuminating the structure with exciting light to cause Raman scattering of one or more excited regions of the pattern structure, while applying a controlled change of at least temperature condition of the patterned structure, and detecting the Raman scattering, and generating corresponding measured data indicative of a temperature dependence of the detected Raman scattering; and analyzing the measured data and generating data indicative of spatial profile of one or more properties of the patterned structure.
A method for use in measuring one or more characteristics of a patterned structure, the method comprising:
A system for measuring one or more characteristics of a patterned structure, the system comprising:
Dependencies are inferred from the claim text.