Photonic device, method for operating a photonic device and method for manufacturing a photonic device

A method for operating a photonic device, wherein the photonic device comprises a pressure-sensitive membrane arranged in or on a substrate and a photonic structure at least partly coupled to the membrane, the method comprising:

• applying a pressure to the membrane,
• detecting a change of an optical property of the photonic structure depending on a deformation induced by the pressure applied to the membrane, wherein the photonic structure is arranged to change the optical property due to tensile strain and compressive strain, and
• changing the optical property which is an index of refraction of the photonic structure, and wherein
• the deformation induced by the pressure applied to the membrane results in a change of the index of refraction of the photonic structure.

A method for manufacturing a photonic device, comprising:

• providing a semiconductor substrate,
• arranging a pressure-sensitive membrane in or on the substrate, and
• coupling a photonic structure at least partly to the membrane, wherein the photonic structure is arranged to change an optical property depending on a deformation to be induced by a pressure applied to the membrane, wherein the photonic structure is arranged to change the optical property due to tensile strain and compressive strain, and wherein
• the optical property which is changed is an index of refraction of the photonic structure, and
• the deformation induced by the pressure applied to the membrane results in a change of the index of refraction of the photonic structure.