Organic film forming apparatus

An organic film forming apparatus comprising:

• a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure;
• at least one processing room provided inside the chamber and being surrounded by a cover;
• and
• an exhaust part configured to exhaust the inside the chamber,
• the processing room including
• an upper heating part including a plurality of first heaters provided to be arranged in a predetermined direction, the plurality of first heaters having a rod shape,
• a lower heating part including a plurality of second heaters provided to be arranged in the predetermined direction, facing the upper heating part, and the plurality of second heaters having a rod shape,
• an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a gap being provided between an upper surface of the upper heat equalizing plate and the lower surfaces of the first heaters,
• a lower heat equalizing plate provided on the upper heating part side of the lower heating part, a gap being provided between an lower surface of the lower heat equalizing plate and the upper surfaces of the second heaters,
• a side heat equalizing plate provided in each of side parts of both sides of the processing room in the predetermined direction,
• a side heat equalizing plate provided on each of both sides of the processing room in a direction orthogonal to the predetermined direction,
• a plurality of workpiece supporters configured to support a workpiece through a gap between the upper heat equalizing plate and the lower heat equalizing plate, the workpiece including a substrate and a solution including polyamic acid coated on an upper surface of the substrate, the workpiece supporters being rod-shaped bodies, and
• an upper heat equalizing plate supporter detachably supporting the upper heat equalizing plate and provided in the processing room,
• wherein
• the upper heating part includes a pair of holders facing in a direction orthogonal to a direction along which the plurality of first heaters are arranged,
• a plurality of the upper heat equalizing plate supporters are fixed to the pair of holders,
• the upper heat equalizing plate includes a bent portion,
• the heat equalizing plate supporter includes a bent portion protruding toward the upper heat equalizing plate,
• when a tip of the bent portion of the heat equalizing plate supporter contacts a lower surface of the upper heat equalizing plate, a tip of the bent portion of the upper heat equalizing plate does not contact the heat equalizing plate supporter,
• when the tip of the bent portion of the heat equalizing plate supporter does not contact the lower surface of the upper heat equalizing plate, the tip of the bent portion of the upper heat equalizing plate contacts the heat equalizing plate supporter,
• the workpiece supported by the workpiece supporters in the processing room being surrounded in all directions by the upper heat equalizing plate, the lower heat equalizing plate and the side heat equalizing plates.