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US 11,899,378 B2Granted
Lithography system and operation method thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChi-Hung Liao, Min-Cheng Wu
Life of this patent
Estimating the term…
Abstract
A lithography system includes a collector having a mirror surface, a laser generator aiming at an excitation zone in front of the mirror surface of the collector, a droplet generator, and a droplet deflector operative to apply a force at a position between the droplet generator and the excitation zone.
Claims20
A lithography system, comprising:
- a collector having a mirror surface;
- a laser generator aiming at an excitation zone in front of the mirror surface of the collector;
- a droplet generator;
- a droplet deflector operative to apply a force at a position between the droplet generator and the excitation zone, wherein the droplet deflector is a sound wave generator;
- and
- a first droplet catcher in front of the mirror surface of the collector, wherein a distance between the first droplet catcher and the collector along a first direction parallel to an optical axis of the collector is greater than a distance between the excitation zone and the collector along the first direction, and wherein a distance between the first droplet catcher and the droplet generator along a second direction perpendicular to the first direction is less than a distance between the excitation zone and the droplet generator along the second direction.
3 more elements
A lithography system, comprising:
- a collector having a mirror surface;
- a laser generator aiming at an excitation zone in front of the mirror surface of the collector;
- a droplet generator configured to generate droplets along a droplet path;
- a droplet deflector operative to apply a sound wave at a position between the droplet generator and the excitation zone;
- a first droplet catcher, wherein the excitation zone is between the droplet generator and the first droplet catcher, and the first droplet catcher is not aligned with the droplet generator;
- and
- a second droplet catcher, wherein the excitation zone is between the laser generator and the second droplet catcher, and wherein a shortest distance between the first droplet catcher and the droplet path is less than a shortest distance between the second droplet catcher and the droplet path.
4 more elements
A lithography system, comprising:
- a collector having a mirror surface;
- a laser generator aiming at an excitation zone in front of the mirror surface of the collector;
- a droplet generator operative to generate droplets along a droplet path;
- a droplet deflector operative to apply a sound wave at a position between the droplet generator and the excitation zone;
- and
- a first droplet catcher, wherein the droplet deflector and the first droplet catcher are disposed on opposite sides of the droplet path.
3 more elements
Dependencies are inferred from the claim text.