Imprint apparatus, imprint method, and article manufacturing method

An imprint method of forming a pattern on a substrate by curing an imprint material by light irradiation in a state in which a mold is in contact with the imprint material on the substrate, the method comprising:

• performing first light irradiation of the imprint material on the substrate to incompletely cure the imprint material in the pattern region before bringing the mold into contact with the imprint material on the substrate;
• performing second light irradiation of the imprint material to further incompletely cure the imprint material in the pattern region, in the state in which the mold is in contact with the imprint material on the substrate;
• aligning the substrate and the mold in a state in which the first light irradiation and the second light irradiation have been performed such that a viscosity resistance of the imprint material in a pattern region of the substrate does not exceed a first threshold;
• and
• performing third light irradiation of the imprint material to completely cure the imprint material in the pattern region after the aligning of the substrate and the mold.

An article manufacturing method comprising:

• forming a pattern on a substrate using an imprint apparatus including:
• a control unit configured to determine a first exposure amount of a first light irradiation and a second exposure amount of a second light irradiation such that a viscosity resistance of the imprint material in a pattern region of the substrate after the first light irradiation and the second light irradiation does not exceed a first threshold;
• a first irradiation unit configured to perform the first light irradiation of the imprint material on the substrate to incompletely cure the imprint material in the pattern region before bringing the mold into contact with the imprint material on the substrate for the aligning;
• a second irradiation unit configured to perform the second light irradiation of the imprint material on the substrate to further incompletely cure the imprint material in the pattern region, in the aligning;
• and
• a third irradiation unit configured to perform third light irradiation of the imprint material on the substrate to completely cure the imprint material in the pattern region, in the curing;
• and
• processing the substrate with the pattern formed thereon,
• wherein an article is manufactured from the processed substrate.