Vacuum pump
AssigneeEdwards Japan Limited
InventorsHideki Enosawa, Manabu Nonaka, Takashi Kabasawa
Life of this patent
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AssigneeEdwards Japan Limited
InventorsHideki Enosawa, Manabu Nonaka, Takashi Kabasawa
Estimating the term…
A deposited material sensor is arranged, in a flow path of a gas from an inlet port to an outlet port, on an upstream side or a downstream side of a predetermined flow path position where a cause of disruption to operation of the vacuum pump is to occur. In addition, the deposited material sensor detects a presence or absence of deposited material at the arrangement position of the deposited material sensor, and the arrangement position of the deposited material sensor is a position where a thickness of the deposited material at the predetermined flow path position assumes a predetermined thickness that corresponds to a maintenance time of maintenance for suppressing the cause when a detection state of the deposited material sensor changes from deposited material absent to deposited material present.
A vacuum pump, comprising:
Dependencies are inferred from the claim text.