High throughput and metal contamination control oven for chamber component cleaning process

A baking chamber for processing a chamber component, comprising:

• an enclosure defining a first chamber, wherein the first chamber comprises:
• a first chamber body having a first floor and first sidewalls that couple the first floor to a first lid of the first chamber body to define a first interior volume;
• a first support disposed in the first interior volume for supporting a chamber component, the first support comprising a pedestal coupled to a shaft;
• a first gas line disposed in the first interior volume proximate the first lid and configured to supply one or more process gases into the first interior volume;
• a first showerhead disposed between the first gas line and the first support, wherein the first showerhead includes a plurality of holes configured to direct the one or more process gases from the first gas line to a region between the first showerhead and the first support;
• a first exhaust coupled to the first floor radially inward of an outer surface of the shaft, wherein the first showerhead and the first exhaust are configured to provide a gas curtain that flows from the first showerhead to the chamber component, around the chamber component, and into the first exhaust during use;
• and
• a first heater disposed in the first interior volume between the first support and the first floor;
• and
• wherein the enclosure includes a door configured to facilitate transferring the chamber component into and out of the enclosure.