Pressure-sensitive adhesive sheet for semiconductor wafer processing

A pressure-sensitive adhesive sheet for semiconductor wafer processing, comprising in this order:

• a base material composed of a resin;
• an intermediate layer including a polymer obtained by polymerizing a monomer composition containing (meth)acrylic acid C1-C20 alkyl esters and an acrylic monomer having a glass transition temperature of 40° C. or more;
• and
• a UV-curable pressure-sensitive adhesive layer including a polymer having a polymerizable carbon-carbon double bond introduced into a side chain thereof,
• wherein the intermediate layer has a storage modulus of elasticity at room temperature, G′1RT, of from 300 kPa to 2,000 kPa, and a storage modulus of elasticity at 80° C., G′180, of from 10 kPa to 500 kPa,
• wherein the UV-curable pressure-sensitive adhesive layer has a storage modulus of elasticity at room temperature, G′2RT, of from 100 kPa to 1,000 kPa, and a storage modulus of elasticity at 80° C., G′280, of from 10 kPa to 1,000 kPa,
• wherein G′1RT/G′2RT is 1 or more, and
• wherein the intermediate layer contains a photopolymerization initiator and is free of any UV-curable component.