Apparatus and method for processing substrate

A substrate processing apparatus comprising:

• a substrate support unit configured to support a substrate;
• a liquid supply unit configured to supply a liquid containing either a chemical liquid or a cleaning liquid to the substrate supported by the substrate support unit;
• a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit;
• and
• a capture module provided in the processing container and configured to capture the liquid scattered from the substrate,
• wherein the capture module is configured to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering, and includes a mesh net structure for capturing the re-scattered liquid,
• is located inside the processing container in a multi-layered form to capture the liquid, and is configured to primarily capture the chemical liquid scattered to the processing container based on the supply of the chemical liquid to the substrate by the liquid supply unit, and
• is configured to secondarily capture the cleaning liquid scattered to the processing container based on the supply of the cleaning liquid to the substrate by the liquid supply unit such that the chemical liquid primarily captured in advance is cleaned through the secondary capture, and
• wherein the capture module is configured to be movable forward and backward in a sliding manner from an inner wall of the processing container and be operated in a position adjustment mode for capturing the liquid.