Nozzle, substrate processing apparatus including the same, and substrate processing method
AssigneeSemes Co., Ltd.
InventorsSunmi Kim, Oh Jin Kwon, Sehyeong Choi
Life of this patent
Estimating the term…
Abstract
The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
Claims13
An apparatus for processing a substrate, the apparatus comprising:
- a housing having a processing space;
- a support unit configured to support the substrate in the processing space;
- and
- a liquid dispensing unit including a nozzle configured to dispense a treatment liquid onto the substrate supported on the support unit,
- wherein the nozzle includes,
- a body having an interior space,
- a liquid supply unit configured to supply the treatment liquid into the interior space,
- a gas supply unit configured to supply a gas into the interior space, and
- electrodes configured to generate plasma in the interior space,
- wherein the liquid supply unit is configured to supply the treatment liquid in a bubbling state into the interior space, or cause the treatment liquid to bubble in the interior space,
- the body includes an insulator wall defining a recess at an upper portion of the body,
- a first electrode from among the electrodes is in the recess, and
- a second electrode from among the electrodes surrounds an exterior of the body.
A nozzle for dispensing a treatment liquid in which plasma is generated, the nozzle comprising:
- a body having an interior space;
- a liquid supply unit configured to supply the treatment liquid into the interior space;
- and
- electrodes configured to generate the plasma in the interior space,
- wherein the liquid supply unit is configured to supply the treatment liquid in a bubbling state into the interior space, or cause the treatment liquid to bubble in the interior space,
- the body includes an insulator wall defining a recess at an upper portion of the body,
- a first electrode from among the electrodes is in the recess, and
- a second electrode from among the electrodes surrounds an exterior of the body.
Dependencies are inferred from the claim text.