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US 11,814,723 B2Granted
Stabilized metal monolayer structure
AssigneeIucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
InventorsMyung Mo Sung, Hong Bum Kim, Jin Won Jung, Kyu Seok Han
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Abstract
A stabilized elementary metal structure is disclosed. The stabilized elementary metal structure may include an elementary metal having at least one layer and having a two-dimensional layer structure, and an organic molecular layer provided on at least one of a top surface and a bottom surface of the elementary metal.
Claims10
A two-dimensional elementary metal structure comprising:
- an elementary metal layer formed using ALD (Atomic Layer Deposition) having 3 to 15 atomic layers and having a two-dimensional structure, wherein the elementary metal layer is formed of a metal selected from Group 4 metals, Group 5 metals, and Group 6 metals;
- and
- organic molecular layers provided on a top surface and a bottom surface of the elementary metal layer,
- wherein each of the organic molecular layers include a bifunctional group or trifunctional group including a chalcogen element and are formed using MLD (Molecular Layer Deposition),
- wherein the elementary metal layer is chemically bonded to the chalcogen element of the organic molecular layers,
- wherein the elementary metal layer has a metallic property according to X-ray photoelectron spectroscopy (XPS) analysis even though the elementary metal layer is chemically bonded to the chalcogen element of the organic molecular layers, and
- wherein the elementary metal layer has semiconductor properties.
4 more elements
A two-dimensional elementary metal structure comprising:
- an elementary metal layer formed using ALD (Atomic Layer Deposition) having 3 to 15 atomic layers and having a two-dimensional structure, wherein the elementary metal layer is formed of a metal selected from Group 4 metals, Group 5 metals, and Group 6 metals;
- and
- organic molecular layers provided on a top surface and a bottom surface of the elementary metal layer,
- wherein each of the organic molecular layers includes a bifunctional group or trifunctional group including a chalcogen element and formed using MLD (Molecular Layer Deposition),
- wherein the elementary metal layer is chemically bonded to the chalcogen element of the organic molecular layers,
- wherein the elementary metal layer has a metallic property according to X-ray photoelectron spectroscopy (XPS) analysis even though the elementary metal layer is chemically bonded to the chalcogen element of the organic molecular layer, and
- wherein the elementary metal layer provides a band gap.
4 more elements
The two-dimensional elementary metal structure comprising:
- an elementary metal layer formed using ALD (Atomic Layer Deposition) having 3 to 15 atomic layers and having a two-dimensional structure, wherein the elementary metal layer is formed of a metal selected from Group 4 metals, Group 5 metals and Group 6 metals;
- and
- adjacent layers having organic molecular layers provided on a top surface and a bottom surface of the elementary metal layer using MLD (Molecular Layer Deposition),
- wherein each of the organic molecular layers includes a bifunctional group or trifunctional group including chalcogen element,
- wherein each of the adjacent layers further comprises a seed layer formed at an interface of each of the organic molecular layers and the elementary metal layer, the seed layer is formed of a material including a chalcogen element using ALD, and the chalcogen element of the seed layer is chemically bonded to the elementary metal layer,
- wherein the elementary metal layer has a metallic property according to X-ray photoelectron spectroscopy (XPS) analysis even though the elementary metal layer is chemically bonded to the chalcogen element of the seed layer, and
- wherein the elementary metal layer has semiconductor properties.
4 more elements
Dependencies are inferred from the claim text.