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US 11,788,923 B2Granted
Method for detecting gas tightness of furnace tube device
AssigneeChangxin Memory Technologies, Inc.
InventorZhipeng Gao
Life of this patent
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Abstract
A method for detecting a gas tightness of a furnace tube device includes: providing a test wafer; conveying the test wafer into the furnace tube device; depositing a dielectric layer on the test wafer; measuring a thickness and a Goodness of Fit (GOF) of the dielectric layer formed on the test wafer by a thickness measuring machine; and judging the gas tightness of the furnace tube device according to the GOF.
Claims15
A method for detecting a gas tightness of a furnace tube device, comprising:
- providing a test wafer;
- conveying the test wafer into the furnace tube device, and depositing a dielectric layer on the test wafer;
- conveying the test wafer deposited with the dielectric layer to a thickness measuring machine, to measure a thickness and a Goodness of Fit (GOF) of the dielectric layer;
- and
- verifying the gas tightness of the furnace tube device according to the GOF of the dielectric layer,
- wherein the test wafer comprises:
- a substrate;
- and
- a tungsten metal layer formed on the substrate.
6 more elements
Dependencies are inferred from the claim text.