Processing liquid ejection nozzle, nozzle arm, substrate processing apparatus, and substrate processing method
AssigneeTokyo Electron Limited
InventorsYoshifumi Amano, Kazuhiro Aiura, Tatsuhiro Ueki
Life of this patent
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Abstract
A processing liquid ejection nozzle ejects a processing liquid used for a substrate processing. The processing liquid ejection nozzle includes a nozzle main body and an angle changing mechanism. The nozzle main body includes a first main body formed with a first flow path therein which communicates with a processing liquid supply path, and a second main body bent from the first main body and formed with a second flow path therein which communicates with the first flow path. The angle changing mechanism changes an angle of the nozzle main body in a horizontal direction with respect to a fixing member to which the nozzle main body is fixed.
Claims22
A processing liquid ejection nozzle comprising:
- a nozzle main body including a first main body formed with a first flow path therein which communicates with a processing liquid supply path of a nozzle block, and a second main body bent from the first main body and formed with a second flow path therein which communicates with the first flow path;
- and
- a connection portion configured to change an attachment position of the nozzle main body relative to nozzle block so as to change an angle of the nozzle main body in a horizontal direction with respect to the nozzle block to which the nozzle main body is fixed.
Dependencies are inferred from the claim text.