Back to results
US 11,768,445 B2Granted
Method and apparatus to register template with spatial light modulator
AssigneeCanon Kabushiki Kaisha
InventorsJames W. Irving, Mehul N. Patel
Life of this patent
Estimating the term…
Abstract
A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.
Claims20
An apparatus comprising:
- a processor;
- and
- a memory storing instructions that, when executed by the processor, cause the processor to perform operations comprising:
- irradiating a formable material in contact with a template to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM),
- inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge,
- determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and
- determining control parameters for the SLM based on the positional offset,
- wherein the predefined registration pattern has a unique pattern in at least one dimension.
5 more elements
A method comprising:
- irradiating a formable material under a template to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM),
- inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge,
- determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and
- determining control parameters for the SLM based on the positional offset,
- wherein the predefined registration pattern has a unique pattern in at least one dimension.
2 more elements
A system comprising:
- a radiation source;
- a spatial light modulator (SLM) having a plurality of elements to modulate light from the radiation source;
- an imprint assembly comprising:
- a template holder to hold a template;
- a substrate holder to hold substrate having a surface on which a formable material is deposited;
- a processor;
- and
- a memory storing instructions that, when executed by the processor, cause the processor to perform operations comprising:
- irradiating the formable material under the template to form a reference film using a predefined registration pattern associated with the SLM,
- inspecting the reference film to generate positional information of the elements of the SLM relative to an imprint field edge,
- determining positional offset of the elements of the SLM with respect to a holder of the template based on the positional information, and
- determining control parameters for the SLM based on the positional offset,
- wherein the predefined registration pattern has a unique pattern in at least one dimension.
10 more elements
Dependencies are inferred from the claim text.