ALD cycle time reduction using process chamber lid with tunable pumping
AssigneeApplied Materials, Inc.
InventorsMuhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Anqing Cui
Life of this patent
Estimating the term…
Abstract
Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.
Claims19
A process chamber lid comprising:
- a pumping liner having a body with an inner wall, an outer wall, a top wall and a bottom wall, the inner wall extending around a central axis spaced a first distance from the central axis to form an open central region;
- a showerhead positioned within the open central region of the pumping liner, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;
- a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface and sidewalls, the front surface spaced a distance from the back surface of the showerhead to form a gap, the sidewalls in contact with the inner wall of the pumping liner to form a plenum, the gas funnel having an opening extending through the back surface to the front surface, the gas funnel including a plurality of apertures extending from the front surface to the back surface of the gas funnel, the apertures extending from a common area adjacent the back surface of the gas funnel to the gap;
- and
- a purge ring having a ring shaped body with an inner peripheral edge, an outer peripheral edge, a top surface and a bottom surface defining a thickness of the body, the purge ring positioned within the open central region of the pumping liner, the bottom surface of the purge ring in contact with the back surface of the gas funnel, a circular channel formed in the bottom surface of the purge ring body positioned adjacent the common area of the apertures in the gas funnel, at least two openings extending from the top surface of the body to the top surface of the circular channel.
A process chamber lid comprising:
- a pumping liner having a body with an inner wall, an outer wall, a top wall and a bottom wall, the inner wall extending around a central axis spaced a first distance from the central axis to form an open central region;
- a showerhead positioned within the open central region of the pumping liner, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;
- a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface and sidewalls, the front surface spaced a distance from the back surface of the showerhead to form a gap, the sidewalls in contact with the inner wall of the pumping liner to form a plenum, the gas funnel having an opening extending through the back surface to the front surface, the gas funnel including a plurality of apertures extending from the front surface to the back surface of the gas funnel, the apertures extending from a common area adjacent the back surface of the gas funnel to the gap and forming a plurality of radial zones of openings in the front surface, each of the radial zones comprises a plurality of apertures extending around the central axis in a circular pattern and spaced at a different distance from the central axis than other radial zones;
- a purge ring having a ring shaped body with an inner peripheral edge, an outer peripheral edge, a top surface and a bottom surface defining a thickness of the body, the purge ring positioned within the open central region of the pumping liner, the bottom surface of the purge ring in contact with the back surface of the gas funnel, a circular channel formed in the bottom surface of the purge ring body positioned adjacent the common area of the apertures in the gas funnel, at least two openings extending from the top surface of the body to the top surface of the circular channel;
- and
- a purge ring exhaust line splitting at a junction to form at least two legs, each leg connecting one of the at least two openings in the purge ring to exhaust downstream of the junction, the purge ring exhaust line comprising a dump valve downstream of the junction and upstream of the exhaust.
Dependencies are inferred from the claim text.