Particle removing assembly and method of cleaning mask for lithography

A cleaning method of a mask for a photolithographic apparatus, wherein the photolithographic apparatus comprises:

• a particle removing cassette having a first slit and an elongated wind blade nozzle extending along a length of the first slit and protruding from the first slit;
• and
• the method comprising:
• ejecting pressurized cleaning material through the elongated wind blade nozzle of the first slit toward debris particles on a patterning surface of the mask to remove the debris particles from the patterning surface of the mask;
• monitoring an amount of the debris particles on the patterning surface of the mask;
• and
• adjusting a flow rate and a pressure of the pressurized cleaning material by a pump and a compressor based on the amount of the debris particles on the patterning surface of the mask.