Apparatus for imprint lithography configured to generate a fluid droplet pattern and a method of using such apparatus
AssigneeCanon Kabushiki Kaisha
InventorAmir Tavakkoli Kermani Ghariehali
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AssigneeCanon Kabushiki Kaisha
InventorAmir Tavakkoli Kermani Ghariehali
Estimating the term…
An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has an edge and a drop edge exclusion along the edge. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications. The method can include determining a fluid droplet pattern with a first row along the edge of the imprint field having a first linear density and a second row having a second linear density, where the first linear density, the amount of droplets in the first row, is different than a second linear density, amount of droplets within the second row.
A method of generating a fluid drop pattern in imprint lithography, the method comprising:
A method of generating a fluid drop pattern in imprint lithography, the method comprising:
A method of manufacturing an article using a method of generating a fluid drop pattern in imprint lithography, the method of manufacturing the article comprising:
Dependencies are inferred from the claim text.