Coating composition for use with an overcoated photoresist
AssigneesRohm and Haas Electronic Materials Korea Ltd., Rohm and Haas Electronic Materials LLC
InventorsHye-Won Lee, Min Kyung Jang, Soo Jung Leem, Jae Hwan Sim, Emad Aqad
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Abstract
A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.
Claims15
A method for forming a photoresist relief image, the method comprising:
- applying a layer of a coating composition on a substrate;
- and
- disposing a layer of a photoresist composition on the layer of the coating composition,
- wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer,
- wherein the amine-containing polymer comprises a repeating structural unit represented by at least one of Formulae (1) or (2):
- wherein, in Formulae (1) and (2),
- R1 to R3 are each independently hydrogen, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C3-10 cycloalkyl group, or a substituted or unsubstituted C6-20 aryl group;
- L1 is a substituted or unsubstituted C1-30 alkylene group, a substituted or unsubstituted C2-30 alkenylene group, a substituted or unsubstituted C1-30 heteroalkene group, a substituted or unsubstituted C3-7 heterocycloalkylene group, a substituted or unsubstituted C6-30 arylene group, a substituted or unsubstituted C3-30 heteroarylene group, —O—, —C(═O)O—, —O(C═O)—, —CONRb—, or —OC(═O)NRb—;
- L2 is a single bond, a substituted or unsubstituted C1-30 alkylene group, a substituted or unsubstituted C2-30 alkenylene group, a substituted or unsubstituted C1-30 heteroalkene group, a substituted or unsubstituted C3-7 heterocycloalkylene group, a substituted or unsubstituted C6-30 arylene group, a substituted or unsubstituted C3-30 heteroarylene group, —(C(Rc)═N—(C2-3)alkylene)n-, —(NRb—(C2-3)alkylene)n—, or —(O—(C2-3alkylene)n-;
- X1 is —N(Rb)2 or a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- X2 is —C(Rc)═NRb, —N═C(Rc)2, —(NRb—(C2-3)alkylene)n-N(Rb)2, —(O—(C2-3)alkylene)n-N(Rb)2, or a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- each Rb is independently hydrogen, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted polycyclic or monocyclic C3-30 cycloalkyl group, or a substituted or unsubstituted polycyclic or monocyclic C6-30 aryl group;
- each Rc is independently hydrogen, a halogen, a cyano group, a nitro group, an amino group, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted C2-30 alkenyl group, a substituted or unsubstituted C2-30 alkynyl group, a substituted or unsubstituted C1-30 alkoxy group, a substituted or unsubstituted C3-30 cycloalkyl group, a substituted or unsubstituted C3-30 cycloalkenyl group, a substituted or unsubstituted C6-30 aryl group, a substituted or unsubstituted C6-30 aryloxy group, a substituted or unsubstituted C6-30 arylthio group, or a substituted or unsubstituted C7-30 arylalkyl group;
- and
- each n is independently an integer from 1 to 20.
A method for forming a photoresist relief image, the method comprising:
- applying a layer of a coating composition on a substrate;
- and
- disposing a layer of a photoresist composition on the layer of the coating composition,
- wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer,
- wherein the amine-containing polymer comprises a repeating structural unit represented by at least one of Formulae (3) or (4):
- wherein, in Formulae (3) and (4),
- R1 and R2 are each independently hydrogen, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C3-10 cycloalkyl group, or a substituted or unsubstituted C6-20 aryl group;
- Q2 is a substituted or unsubstituted aliphatic group, a substituted or unsubstituted cycloaliphatic group, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —N(Rb)—, —COO—, —CONRb—, —CONRb—, and —OCONRb—, and wherein Q2 is optionally a branching group connected to at least two repeat units represented by Formula (3);
- Ar is a substituted or unsubstituted C6-18 arylene group or a substituted or unsubstituted C3-18 heteroarylene group;
- X3 is a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- Ra is hydrogen or a substituted or unsubstituted C1-30 alkyl group;
- and
- each Rb is independently hydrogen, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted polycyclic or monocyclic C3-30 cycloalkyl group, or a substituted or unsubstituted polycyclic or monocyclic C6-30 aryl group.
A coating composition for use with an overcoated photoresist composition, the coating composition comprising an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer,
- wherein the amine-containing polymer comprises a repeating structural unit represented by at least one of Formulae (1) or (2):
- wherein, in Formulae (1) and (2),
- R1 to R3 are each independently hydrogen, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C3-10 cycloalkyl group, or a substituted or unsubstituted C6-20 aryl group;
- L1 is a substituted or unsubstituted C1-30 alkylene group, a substituted or unsubstituted C2-30 alkenylene group, a substituted or unsubstituted C1-30 heteroalkene group, a substituted or unsubstituted C3-7 heterocycloalkylene group, a substituted or unsubstituted C6-30 arylene group, a substituted or unsubstituted C3-30 heteroarylene group, —O—, —C(═O)O—, —O(C═O)—, —CONRb—, or —OC(═O)NRb—;
- L2 is a single bond, a substituted or unsubstituted C1-30 alkylene group, a substituted or unsubstituted C2-30 alkenylene group, a substituted or unsubstituted C1-30 heteroalkene group, a substituted or unsubstituted C3-7 heterocycloalkylene group, a substituted or unsubstituted C6-30 arylene group, a substituted or unsubstituted C3-30 heteroarylene group, —(C(Rc)═N—(C2-3)alkylene)n-, —(NRb—(C2-3)alkylene)n-, or —(O—(C2-3)alkylene)n-;
- X1 is —N(Rb)2 or a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- X2 is —C(Rc)═NRb, —N═C(Rc)2, —(NRb—(C2-3)alkylene)n-N(Rb)2, —(O—(C2-3)alkylene)n-N(Rb)2, or a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- each Rb is independently hydrogen, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted polycyclic or monocyclic C3-30 cycloalkyl group, or a substituted or unsubstituted polycyclic or monocyclic C6-30 aryl group;
- each Rc is independently hydrogen, a halogen, a cyano group, a nitro group, an amino group, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted C2-30 alkenyl group, a substituted or unsubstituted C2-30 alkynyl group, a substituted or unsubstituted C1-30 alkoxy group, a substituted or unsubstituted C3-30 cycloalkyl group, a substituted or unsubstituted C3-30 cycloalkenyl group, a substituted or unsubstituted C6-30 aryl group, a substituted or unsubstituted C6-30 aryloxy group, a substituted or unsubstituted C6-30 arylthio group, or a substituted or unsubstituted C7-30 arylalkyl group;
- and
- each n is independently an integer from 1 to 20.
A coating composition for use with an overcoated photoresist composition, the coating composition comprising an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer,
- wherein the amine-containing polymer comprises a repeating structural unit represented by at least one of Formulae (3) or (4):
- wherein, in Formulae (3) and (4),
- R1 and R2 are each independently hydrogen, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C3-10 cycloalkyl group, or a substituted or unsubstituted C6-20 aryl group;
- Q2 is a substituted or unsubstituted aliphatic group, a substituted or unsubstituted cycloaliphatic group, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —N(Rb)—, —COO—, —CONRb—, —CONRb—, and —OCONRb—, and wherein Q2 is optionally a branching group connected to at least two repeat units represented by Formula (3);
- Ar is a substituted or unsubstituted C6-18 arylene group or a substituted or unsubstituted C3-18 heteroarylene group;
- X3 is —N(Rb)2 or a substituted or unsubstituted nitrogen-containing monocyclic, polycyclic, or fused polycyclic C2-7 heterocycloalkyl group or C3-30 heteroaryl group;
- Ra is hydrogen or a substituted or unsubstituted C1-30 alkyl group;
- and
- each Rb is independently hydrogen, a substituted or unsubstituted C1-30 alkyl group, a substituted or unsubstituted polycyclic or monocyclic C3-30 cycloalkyl group, or a substituted or unsubstituted polycyclic or monocyclic C6-30 aryl group.
Dependencies are inferred from the claim text.