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US 11,530,480 B2Granted
Injector for batch processing and methods of use
AssigneeApplied Materials, Inc.
InventorsJoseph Yudovsky, Kevin Griffin, Mandyam Sriram
Life of this patent
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Abstract
Apparatus and methods for processing a substrate including an injector unit, comprising a leading reactive gas port extending along a length of the injector unit, a trailing reactive gas port extending along the length of the injector unit, and a merge vacuum port forming a boundary around and enclosing the leading reactive gas port and the trailing reactive gas port.
Claims11
A processing method comprising:
- laterally moving a substrate surface through a gas curtain to a mixed region of a processing chamber;
- and
- exposing at least a portion of the substrate surface a mixed process region enclosed within a merge vacuum port of an injector unit, the mixed process region comprising a leading reactive gas from a leading reactive gas port, a trailing reactive gas same as the leading reactive gas from a trailing reactive gas port, and an intermediate reactive gas different from the first reactive gas and second reactive gas from at least one intermediate gas port positioned in the mixing zone between the leading reactive gas port and the trailing reactive gas port, the at least one intermediate gas port occupying in the range of about 10% to about 60% of an area of the mixed process region,
- wherein a combination of the reactive gas ports within the merge vacuum port occupy greater than or equal to about 50% of the area enclosed within the merge vacuum port.
1 more element
Dependencies are inferred from the claim text.