Fluid handling structure for lithographic apparatus

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising:

• an aperture formed therein for the passage therethrough of a projection beam through the immersion fluid;
• a first part;
• and
• a second part,
• wherein the first and/or second part defines a surface adapted for the extraction of immersion fluid from the region,
• wherein the fluid handling structure is adapted to provide a fluid flow into or out of the surface of the fluid handling structure,
• wherein relative movement between the first part and the second part is effective to change a position of the fluid flow into or out of the surface relative to the aperture,
• wherein one of the first or second part comprises at least one through-hole for the fluid flow therethrough and the other of the first or second part comprises at least one opening for the fluid flow therethrough, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of at least one opening of the at least one opening with at least one through-hole of the at least one through-hole to change the position of the fluid flow into or out of the surface relative to the aperture, and
• wherein the at least opening is defined by an annular chamber provided above the at least one through-hole and the annular chamber has a relatively large volume compared to the total volume of the at least one through-hole.

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising:

• a first part defining an aperture formed therein for the passage therethrough of a projection beam through the immersion fluid;
• a second part defining a surface configured to supply and/or extract immersion fluid from the region;
• and
• a bearing arranged between the first part and the second part,
• wherein the second part comprises at least one through-hole configured to provide a fluid into or out of the surface of the fluid handling structure and a chamber being in fluid communication with the at least one through-hole, and
• wherein relative movement between the first and second parts changes a position of the fluid flow into or out of the surface relative to the aperture.