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US 11,454,879 B2Granted
Mask treating method
AssigneeSamsung Electronics Co., Ltd.
InventorsYunsong Jeong, Hyunseok Uhm, SunPyo Lee
Life of this patent
Estimating the term…
Abstract
Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.
Claims19
A mask treating method comprising:
- creating on a blank mask a fiducial mark serving as a reference point to determine a defect position on the blank mask,
- wherein creating the fiducial mark comprises:
- selecting one of a first mode and a second mode based on an uppermost layer of the blank mask;
- irradiating a laser light onto a first side of the blank mask to form the fiducial mark under the first mode;
- and
- reversing the blank mask upside down and then irradiating the laser light onto a second side of the blank mask to form the fiducial mark under the second mode.
3 more elements
A mask treating method comprising:
- providing a blank mask package that includes a blank mask;
- unpacking the blank mask package to provide the blank mask;
- and
- creating on the blank mask a fiducial mark serving as a reference point to determine a defect position on the blank mask,
- wherein creating on the blank mask the fiducial mark comprises:
- selecting one of a first mode and a second mode based on an uppermost layer of the blank mask;
- irradiating a laser light onto a first side of the blank mask to form the fiducial mark under the first mode;
- and
- reversing the blank mask upside down and then irradiating the laser light onto a second side of the blank mask to form the fiducial mark under the second mode.
6 more elements
A mask treating method comprising:
- providing a blank mask package that includes a blank mask;
- unpacking the blank mask package to provide the blank mask;
- and
- creating a fiducial mark on the blank mask, the fiducial mark serving as a reference point to determine a defect position on the blank mask,
- wherein the creating the fiducial mark comprises selecting one of a first mode and a second mode based on an uppermost layer of the blank mask,
- wherein the first mode is selected when metal is included in the uppermost layer, and
- wherein the second mode is selected when photoresist or quartz substrate is included in the uppermost layer.
4 more elements
Dependencies are inferred from the claim text.