Memory devices and methods of forming memory devices
AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsDesmond Jia Jun Loy, Eng Huat Toh, Shyue Seng Tan
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AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsDesmond Jia Jun Loy, Eng Huat Toh, Shyue Seng Tan
Estimating the term…
A memory device may be provided, including first, second and third electrodes, first and second mask elements and a switching layer. The first mask element may be arranged over a portion of and laterally offset from the first electrode. The second electrode may be arranged over the first mask element. The second mask element may be arranged over the second electrode. The third electrode may be arranged over a portion of and laterally offset from the second mask element. The switching layer may be arranged between the first electrode and the third electrode, along a first side surface of the first mask element, a first side surface of the second electrode and a first side surface of the second mask element.
A memory device comprising:
A method of fabricating a memory device, the method comprising:
Dependencies are inferred from the claim text.