Wafer storage container
OwnerBum Je Wooinventor
Life of this patent
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Abstract
The present invention relates to a wafer storage container capable of removing fumes on a wafer or removing moisture therefrom by supplying purge gas to the wafer stored in a storage chamber. More particularly, the present invention relates to a wafer storage container, in which uniform purge gas injection is achieved and thus formation of dead regions is minimized, formation of turbulence in a storage chamber is prevented and thus wafer purging efficiency is improved, and a size reduction of an injection member injecting purge gas into the storage chamber is achieved and thus a size reduction of the entire wafer storage container is achieved.
Claims6
A wafer storage container, comprising:
- a storage chamber in which a wafer received through a front opening is stored;
- and
- an injection member disposed on at least a portion of a circumferential surface of the storage chamber and injecting purge gas into the storage chamber,
- wherein the injection member includes:
- an inflow hole through which the purge gas flows into the injection member;
- multiple injection holes arranged on the portion of the circumferential surface of the storage chamber such that the purge gas is injected into the storage chamber through the injection holes;
- and
- a branch passage portion having at least one branch section such that the purge gas having flowed through the inflow hole is allowed to flow to the multiple injection holes, the branch passage portion being provided on a surface parallel to the portion of the circumferential surface of the storage chamber,
- wherein the branch passage portion includes:
- a main passage communicating with the inflow hole and formed vertically in the surface parallel to the portion of the circumferential surface of the storage chamber;
- and
- multiple branch passages allowing the main passage and each of the multiple injection holes to communicate with each other, and configured such that the branch passages are branched symmetrically with each other with respect to the main passage to form the branch section, the branch passages being formed horizontally in the surface parallel to the portion of the circumferential surface of the storage chamber,
- wherein the inflow hole is formed to be positioned at the main passage.
Dependencies are inferred from the claim text.